By Kenichiro Nakamura
ISBN-10: 146651728X
ISBN-13: 9781466517288
Advancements in photopolymers have resulted in groundbreaking achievements within the electronics, print, optical engineering, and scientific fields. at this time, photopolymers have myriad functions in semiconductor gadget production, published circuit forums (PCBs), ultraviolet (UV) curing, printing plates, three-D printing, microelectromechanical structures (MEMS), and scientific fabrics. approaches similar to photopolymerization, photodegradation, and photocrosslinking, in addition to lithography expertise during which photofabrications are played by means of photographs of photopolymers, have given upward thrust to very large-scale built-in (VLSI) circuits, microproducts, and more.
Addressing subject matters comparable to chemically amplified resists, immersion lithography, severe ultraviolet (EUV) lithography, and nanoimprinting, Photopolymers: Photoresist fabrics, strategies, and purposes covers photopolymers from center options to business functions, delivering the chemical formulae and constructions of the fabrics mentioned in addition to functional case reports from a few of the world’s biggest firms. delivering a cutting-edge evaluate of growth within the improvement of photopolymers, this booklet offers invaluable perception into present and destiny possibilities for photopolymer use.
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Photopolymers: Photoresist Materials, Processes, and Applications (Optics and Photonics) by Kenichiro Nakamura
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